ASML HOLDING N.V.
Patent Owner
Stats
- 445 US PATENTS IN FORCE
- 18 US APPLICATIONS PENDING
- Mar 08, 2018 most recent publication
Details
- 445 Issued Patents
- 0 Issued in last 3 years
- 0 Published in last 3 years
- 10,334 Total Citation Count
- Oct 05, 1981 Earliest Filing
- 226 Expired/Abandoned/Withdrawn Patents
Patent Activity in the Last 10 Years
Technologies
Intl Class
Technology
Matters
Rank in Class
Top Patents (by citation)
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Recent Publications
Publication #
Title
Filing Date
Pub Date
Intl Class
2018/0067,057 METHOD AND DEVICE FOR FOCUSING IN AN INSPECTION SYSTEMAug 22, 17Mar 08, 18[G01N, G03F]
2017/0293,231 IMMERSION PHOTOLITHOGRAPHY SYSTEM AND METHOD USING MICROCHANNEL NOZZLESJun 19, 17Oct 12, 17[H01L, G03F]
2017/0277,046 METHOD AND APPARATUS FOR SPECTRALLY BROADENING RADIATIONAug 11, 15Sep 28, 17[G02B, G01B, G03F]
2017/0192,359 SUBSTRATE SUPPORT, METHOD FOR LOADING A SUBSTRATE ON A SUBSTRATE SUPPORT LOCATION, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHODApr 23, 15Jul 06, 17[H01L, G03F]
2017/0068,171 Estimating Deformation of a Patterning Device and/or a Change in Its PositionMar 05, 15Mar 09, 17[G01B, G03F]
Recent Patents
Patent #
Title
Filing Date
Issue Date
Intl Class
9910368 Patterning device manipulating system and lithographic apparatusesSep 20, 13Mar 06, 18[G03F]
9904173 Method and apparatuses for optical pupil symmetrizationDec 15, 15Feb 27, 18[G01N, G02B, G03B, G03F]
9891540 Measuring method, measurement apparatus, lithographic apparatus and device manufacturing methodMay 29, 15Feb 13, 18[G03B, G01B, G03F]
9857694 Estimating deformation of a patterning device and/or a change in its positionMar 05, 15Jan 02, 18[G03B, G01B, G03F]
9766557 Patterning device support, lithographic apparatus, and method of controlling patterning device temperatureFeb 21, 17Sep 19, 17[G03F]
9715178 Immersion photolithography system and method using microchannel nozzlesApr 30, 14Jul 25, 17[G03B, G03F]
Expired/Abandoned/Withdrawn Patents
Patent #
Title
Status
Filing Date
Issue/Pub Date
Intl Class
2015/0256,058 Linear Motor and Lithography Arrangement Including Linear MotorAbandonedMay 21, 15Sep 10, 15[H02K, G03F]
2015/0085,291 Compact Self-Contained Holographic and Interferometric ApparatusAbandonedJan 31, 13Mar 26, 15[G01B, G03H]
8654305 Systems and methods for insitu lens cleaning in immersion lithographyExpiredFeb 15, 07Feb 18, 14[G03B]
8629970 Immersion lithographic apparatus with immersion fluid re-circulating systemExpiredJan 16, 09Jan 14, 14[G03B]
8625096 Method and system for increasing alignment target contrastExpiredMar 24, 10Jan 07, 14[H01L, G03C, G03B, G01B, G03F]
RE44434 Optical position measuring system and method using a low coherence light sourceExpiredAug 31, 12Aug 13, 13[G01B]
2013/0017,378 Apparatus and Method for Providing Resist Alignment Marks in a Double Patterning Lithographic ProcessAbandonedSep 14, 12Jan 17, 13[G03B, G03F, B32B]
2013/0010,277 System and Method for Using a Two Part Cover and a Box for Protecting a ReticleAbandonedSep 14, 12Jan 10, 13[G03B]
2013/0011,547 Optical Component Fabrication Using Coated SubstratesAbandonedSep 14, 12Jan 10, 13[B05D]
8329366 Apparatus and method for providing resist alignment marks in a double patterning lithographic processExpiredApr 27, 10Dec 11, 12[G03F]
2012/0281,197 Holographic Mask Inspection System with Spatial FilterAbandonedNov 12, 10Nov 08, 12[G03B, G03H]
8168017 Bonding silicon silicon carbide to glass ceramicsExpiredFeb 04, 10May 01, 12[C09J, B05D, C03B, B29C]
2011/0317,136 Inspection Apparatus Employing Wide Angle Objective Lens With Optical WindowAbandonedApr 08, 11Dec 29, 11[G01N, G03B]
8085383 System, method, and apparatus for scanning detector for fast and frequent illumination uniformity correction moduleExpiredOct 27, 05Dec 27, 11[G03B]
8054449 Enhancing the image contrast of a high resolution exposure toolExpiredNov 22, 06Nov 08, 11[G03B]
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